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High-power EUV sources for lithography: a comparison of laser-produced plasma and gas-discharge-produced plasma

Author(s):
Stamm, U. ( XTREME technologies GmbH (Germany) )
Ahmad, I.
Borisov, V.M. ( Troitsk Institute of Innovation and Fusion Research (Russia) )
Flohrer, F. ( XTREME technologies GmbH (Germany) )
Gaebel, K.
Goetze, S.
Ivanov, A.S. ( Troitsk Institute of Innovation and Fusion Research (Russia) )
Khristoforov, O,B.
Kloepfel, D. ( XTREME technologies GmbH (Germany) )
Koehler, P.
Kleinschmidt, J.
Korobotchko, V.
Ringling, J.
Schriever, G.
Vinokhodov, A.Y. ( Troitsk Institute of Innovation and Fusion Research(Russia) )
10 more
Publication title:
Emerging Lithographic Technologies VI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4688
Pub. Year:
2002
Vol.:
Part One
Page(from):
122
Page(to):
133
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444349 [0819444340]
Language:
English
Call no.:
P63600/4688
Type:
Conference Proceedings

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