High-power EUV sources for lithography: a comparison of laser-produced plasma and gas-discharge-produced plasma
- Author(s):
Stamm, U. ( XTREME technologies GmbH (Germany) ) Ahmad, I. Borisov, V.M. ( Troitsk Institute of Innovation and Fusion Research (Russia) ) Flohrer, F. ( XTREME technologies GmbH (Germany) ) Gaebel, K. Goetze, S. Ivanov, A.S. ( Troitsk Institute of Innovation and Fusion Research (Russia) ) Khristoforov, O,B. Kloepfel, D. ( XTREME technologies GmbH (Germany) ) Koehler, P. Kleinschmidt, J. Korobotchko, V. Ringling, J. Schriever, G. Vinokhodov, A.Y. ( Troitsk Institute of Innovation and Fusion Research(Russia) ) - Publication title:
- Emerging Lithographic Technologies VI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4688
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 122
- Page(to):
- 133
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444349 [0819444340]
- Language:
- English
- Call no.:
- P63600/4688
- Type:
- Conference Proceedings
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