New flexible origination technology based on electron-beam lithography and its intergration into security devices in combination with covert features based on DNA authentication

New flexible origination technology based on electron-beam lithography and its intergration into security devices in combination with covert features based on DNA authentication

Author(s):

Drinkwater, J.K. ( Optaglio Ltd. (UK) )
Ryzi, Z. ( Optaglio sro (Czech Republic) )
Outwater, C.S. ( DNA Technologies, Inc. (USA) )

Publication title:

Optical Security and Counterfeit Deterrence Techniques IV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4677

Pub. Year:

2002

Page(from):

203

Page(to):

214

Pages:

12

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444172 [0819444170]

Language:

English

Call no.:

P63600/4677

Type:

Conference Proceedings

Details

TDL ID:	ZA00012506
Series ID:	PA00000029
Conf. info. (Name):	IS&T/SPIE Electronic Imaging : Optical security and counterfeit deterrence techniques
Conf. info. (Number):	2002 : 4th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2002.01.23-2002.01.25

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