Study of improvement of imaging quality in project photolithography with amplitude phase compound filtering

Study of improvement of imaging quality in project photolithography with amplitude phase compound filtering

Author(s):

Chen, X. ( Institute of Optics and Electronics (China) )
Kang, X.
Luo, X.
Shi, J.

Publication title:

Semiconductor Optoelectronic Device Manufacturing and Applications

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4602

Pub. Year:

2001

Page(from):

325

Page(to):

328

Pages:

4

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819443410 [0819443417]

Language:

English

Call no.:

P63600/4602

Type:

Conference Proceedings

Details

TDL ID:	ZA00012430
Series ID:	PA00000029
Conf. info. (Name):	Semiconductor optoelectronic device manufacturing and applications
Conf. info. (Number):	2001
Conf. info. (Venue):	Nanjing, China
Conf. info. (Date):	2001.11.07-2001.11.09

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