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Layout techniques for VLSI yield enhancement (Invited Paper)

Author(s):
Publication title:
Advances in microelectronic device technology : 7-9 November 2001, Nanjing, China
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4600
Pub. Year:
2001
Page(from):
140
Page(to):
147
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819443397 [0819443395]
Language:
English
Call no.:
P63600/4600
Type:
Conference Proceedings

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