Porous silicon as a sacrificial layer used in rf MEMS

Porous silicon as a sacrificial layer used in rf MEMS

Author(s):

Cong, P. ( Tsinghua Univ. (China) )
Liu, L.-T.
Ding, Y.

Publication title:

Device and process technologies for MEMS and Microelectronics II : 17-19 December 2001, Adelaide, Australia

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4592

Pub. Year:

2001

Page(from):

396

Page(to):

399

Pages:

4

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819443229 [0819443220]

Language:

English

Call no.:

P63600/4592

Type:

Conference Proceedings

Details

TDL ID:	ZA00012420
Series ID:	PA00000029
Conf. info. (Name):	Smart Materials, Nano-, and Micro- Smart Systems : Device and process technologies for MEMS and Microelectronics
Conf. info. (Number):	2001 : 2nd
Conf. info. (Venue):	Adelaide, Australia
Conf. info. (Date):	2001.12.17-2001.12.19

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