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PZT stack etch for MEMS devices in a capacitively coupled high-density plasma reactor

Author(s):
Publication title:
Device and process technologies for MEMS and Microelectronics II : 17-19 December 2001, Adelaide, Australia
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4592
Pub. date:
2001
Page(from):
267
Page(to):
273
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819443229 [0819443220]
Language:
English
Call no.:
P63600/4592
Type:
Conference Proceedings

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