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Evaluation of various alternating phase shifting mask processes for KrF lithography

Author(s):
Yoon,S.-Y. ( PKL )
Cha,H.-S.
Choi,S.-J.
Jung,S.-M.
Choi,S.-S.
Jeong,S.-H.
1 more
Publication title:
21st Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4562
Pub. date:
2001
Vol.:
4562
Pt.:
Two of Two Parts
Page(from):
1017
Page(to):
1025
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819442901 [0819442909]
Language:
English
Call no.:
P63600/4562
Type:
Conference Proceedings

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