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Optimization of alternating phase shifting mask structure

Author(s):
Cha,H.-S. ( PKL )
Choi,S.-J.
Yoon,S.-Y.
Jung,S.-M.
Choi,S.-S.
Jeong,S.-H.
1 more
Publication title:
21st Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4562
Pub. date:
2001
Vol.:
4562
Pt.:
Two of Two Parts
Page(from):
1008
Page(to):
1016
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819442901 [0819442909]
Language:
English
Call no.:
P63600/4562
Type:
Conference Proceedings

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