Verification of the effect of mask on the mask error enhancement factor of contact holes

Verification of the effect of mask on the mask error enhancement factor of contact holes

Author(s):

Reilly,M.T. ( Sipley Co., LLC )

Publication title:

21st Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4562

Pub. Year:

2001

Vol.:

4562

Pt.:

Two of Two Parts

Page(from):

948

Page(to):

953

Pages:

6

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819442901 [0819442909]

Language:

English

Call no.:

P63600/4562

Type:

Conference Proceedings

Details

TDL ID:	ZA00012276
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2001 : 21st
Conf. info. (Venue):	Monterey, CA, USA
Conf. info. (Date):	2001.10.03-2001.10.05

Similar Items:

1 Conference Proceedings Effects of mask bias on the mask error enhancement factor (MEEF) of contact holes Kang,D., Robertson,S.A., Reilly,M.T., Pavelchek,E.K. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Factors affecting pitch bias in lithography simulation Robertson,S.A., Pavelchek,E.K., Swible-Keane,C.I., Bohiand,J.F., Reilly,M.T. SPIE - The International Society for Optical Engineering
2 Conference Proceedings Novel analysis technique for examining the effect of exposure conditions on the mask error enhancement factor Robertson,S.A., Reilly,M.T., Parker,C.R. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Understanding the impact of full-field mask error factor Conley,W.E., Shi,X., Hankinson,M., Dusa,M.V., Socha,R.J., Garza,C. SPIE - The International Society for Optical Engineering
3 Conference Proceedings Manufacturing considerations for MEEF minimization and process window optimization for 180-nm contact holes Kang,D., Robertson,S.A., Reilly,M.T., Pavelchek,E.K. SPIE-The International Society for Optical Engineering	9 Conference Proceedings MEEF measurement and model verification for 0.3-k1 lithography Parker,C.R., Reilly,M.T. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Comparison of OPC rules and common process windows for 130-nm features using binary and attenuated phase-shift masks Reilly,M.T., Parker,C., Kvam,K., Socha,R.J., Dusa,M.V. SPIE - The International Society for Optical Engineering	10 Conference Proceedings Contact and via hole mask design optimization for 65-nm technology node Van Den Broeke, D., Shi, X., Socha, R., Laidig, T., Hollerbach, U., Wampler, K. E., Hsu, S., Chen, J. F., Corcoran, N. … SPIE - The International Society of Optical Engineering
5 Conference Proceedings MEEF management and the effect of assist feature optical proximity corrections Reilly,M.T., Parker,C.R., Robertson,S.A. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Impact of optical enhancement techniques on the mask error enhancement function(MEEF) Plat,M.V., Nguyen,K.B., Spence,C.A., Lyons,C.F., Wilkison,A. SPIE - The International Society for Optical Engineering
6 Conference Proceedings Aberration's impact on subresolution contact hole process windows in ultrathin imaging resist Reilly, M.T., Finders, J., Dusa, M. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Resolution capability and the mask error enhancement function (MEEF) for ArF and KrF lithography Plat,M.V., Spence,C.A., Lyons,C.F., Wilkison,A. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12