EPL reticle technology
- Author(s):
- Katakura,N. ( Nikon Corp. )
- Takahashi,S.
- Okada,M.
- Shimizu,S.
- Kawata,S.
- Publication title:
- 21st Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4562
- Pub. Year:
- 2001
- Vol.:
- 4562
- Pt.:
- Two of Two Parts
- Page(from):
- 893
- Page(to):
- 901
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819442901 [0819442909]
- Language:
- English
- Call no.:
- P63600/4562
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Pattern distortion of the stencil reticle caused by stress of silicon membrane and resist on the reticle
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
The improvement of the overlay accuracy using the reticle distortion correction for EPL technologies
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Predicting local thermomechanical distortions of the 200-mm EPL mask system
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
Supercritical resist dry technique for electron-beam projection lithography (EPL)
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Defect printability analysis on electron projection lithography with diamond stencil reticle
SPIE-The International Society for Optical Engineering |
Trans Tech Publications |