Use of KRS-XE positive chemically amplified resist for optical mask manufacturing

Use of KRS-XE positive chemically amplified resist for optical mask manufacturing

Author(s):

Ashe,B. ( IBM Microelectronics Div. )

Publication title:

21st Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4562

Pub. Year:

2001

Vol.:

4562

Pt.:

Two of Two Parts

Page(from):

664

Page(to):

672

Pages:

9

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819442901 [0819442909]

Language:

English

Call no.:

P63600/4562

Type:

Conference Proceedings

Details

TDL ID:	ZA00012276
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2001 : 21st
Conf. info. (Venue):	Monterey, CA, USA
Conf. info. (Date):	2001.10.03-2001.10.05

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