Extending the performance of KRS-XE for high-throughput electron-beam lithography for advanced mask making
- Author(s):
Medeiros,D.R. ( IBM Thomas J.,Watson Research Ctr. ) Petrillo,K.E. Bucchignano,J. Angelopoulos,M. Huang,W.-S. Li,W. Moreau,W.M. Lang,R. Kwong,R.W. Magg,C. Ashe,B. - Publication title:
- 21st Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4562
- Pub. Year:
- 2001
- Vol.:
- 4562
- Pt.:
- Two of Two Parts
- Page(from):
- 552
- Page(to):
- 560
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819442901 [0819442909]
- Language:
- English
- Call no.:
- P63600/4562
- Type:
- Conference Proceedings
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