Adjustment of optical proximity correction (OPC) software for mask process correction (MPC). Module 1: Optical mask writing tool simulation
- Author(s):
Barberet,A. ( DuPont Photomasks, Inc. ) Fanget,G.L. Buck,P.D. Toublan,O. Richoilley,J.-C. Tissier,M. - Publication title:
- 21st Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4562
- Pub. Year:
- 2001
- Vol.:
- 4562
- Pt.:
- Two of Two Parts
- Page(from):
- 511
- Page(to):
- 521
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819442901 [0819442909]
- Language:
- English
- Call no.:
- P63600/4562
- Type:
- Conference Proceedings
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