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Characterization of quartz-etched PSM masks for KrF lithography at the 100-nm node

Author(s):
Rhyins,P. ( Photronics, Inc. )
Fritze,M.
Chan,D.
Carney,C.
Blachowicz,B.A.
Vieira,M.
Mack,C.A.
2 more
Publication title:
21st Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4562
Pub. date:
2001
Vol.:
4562
Pt.:
One of Two Parts
Page(from):
486
Page(to):
495
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819442901 [0819442909]
Language:
English
Call no.:
P63600/4562
Type:
Conference Proceedings

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