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Alternating phase shifting mask implementation to 0.1-μm logic gates

Author(s):
Chang,C.-H. ( Taiwan Semiconductor Manufacturing Co., Ltd. )
Tzu,S.-D.
Hsieh,C.-H.
Dai,C.M.
Lin,B.J.
Lin,C.-H.
Liu,H.-Y.
2 more
Publication title:
21st Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4562
Pub. Year:
2001
Vol.:
4562
Pt.:
One of Two Parts
Page(from):
368
Page(to):
378
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819442901 [0819442909]
Language:
English
Call no.:
P63600/4562
Type:
Conference Proceedings

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