Use of nanomachining as a technique to reduce scrap of high-end photomasks

Use of nanomachining as a technique to reduce scrap of high-end photomasks

Author(s):

Publication title:

21st Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4562

Pub. Year:

2001

Vol.:

4562

Pt.:

One of Two Parts

Page(from):

213

Page(to):

224

Pages:

12

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819442901 [0819442909]

Language:

English

Call no.:

P63600/4562

Type:

Conference Proceedings

Details

TDL ID:	ZA00012276
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2001 : 21st
Conf. info. (Venue):	Monterey, CA, USA
Conf. info. (Date):	2001.10.03-2001.10.05

Similar Items:

1 Conference Proceedings High-precision mask repair using nanomachining Verbeek, M., White, R., Klos, M. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Nanomachining processes for 45, 32 nm node mask repair and beyond T. Robinson, A. Dinsdale, R. Bozak, R. White, M. Archuletta Society of Photo-optical Instrumentation Engineers
2 Conference Proceedings Nanomachining photomask repair of complex patterns T. Robinson, A. Dinsdale, M. Archuletta, R. Bozak, R. White Society of Photo-optical Instrumentation Engineers	8 Conference Proceedings Optimization of nanomachining repair condition for ArF lithography Amano, T., Nishiguchi, M., Hashimoto, H., Morikawa, Y., Hayashi, N., White, R., Bozak, R., Terrill, L. SPIE - The International Society of Optical Engineering
3 Conference Proceedings Defect repair performance using the nanomachining repair technique Morikawa, Y., Kokubo, H., Nishiguchi, M., Hayashi, N., White, R., Bozak, R., Terrill, L. SPIE-The International Society for Optical Engineering	9 Conference Proceedings Use of nanomachining for 100-nm mask repair LoBianco, B., White, R., Nawrocki, T. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Correlation of inspection methods in characterizing nanomachined photomask repairs Csuy, J.E., Bozak, R.R., Terrill, L., White, R., Nishida, N. SPIE - The International Society of Optical Engineering	10 Conference Proceedings Use of nanomachining for 100-nanometer mask repair LoBianco, B.T., White, R., Nawrocki, T. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Investigation of nanomachining as a technique for geometry reconstruction Brinkley, D., Bozak, R., Chiu, B., Ly, C., Tolani, V., White, R. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Quality assessment of advanced photomasks using the Q-CAP cluster tool Peter,K., Schatz,T., Ordynskyy,V., Liebe,R., Verbeek,M., Galan,G., Baracchi,E., Miramond,C., Bruck,H.-J., Scheuring,G., … SPIE-The International Society for Optical Engineering
6 Conference Proceedings Use of nanomachining for subtractive repair of EUV and other challenging mask defects Brinkley, D., White, R., Bozak, R., Liang, T., Liu, G. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Practical laser mask repair in the contemporary production environment T. Robinson, R. White, M. Archuletta, R. Bozak Society of Photo-optical Instrumentation Engineers

1

2

3

4

5

6

7

8

9

10

11

12