Blank Cover Image

New approaches to alternating phase-shift mask inspection

Author(s):
Zurbrick,L. ( KLA-Tencor Corp. )
Heumann,J.P.
Rudzinski,M.W.
Stokowski,S.E.
Urbach,J.-P.
Wang,L.
1 more
Publication title:
21st Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4562
Pub. Year:
2001
Vol.:
4562
Pt.:
One of Two Parts
Page(from):
138
Page(to):
144
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819442901 [0819442909]
Language:
English
Call no.:
P63600/4562
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Alternating phase-shift mask inspection using multiple simultaneous illumunation techniques

Zurbrick, L.S., Heumann, J.P., Rudzinski, M.W., Stokowski, S.E., Urbach, J.-P, Wang, L.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings AltPSM inspection capability and printability of quartz defects

Heumann, J.P., Zarrabian, M., Hennig, M., Dettmann, W., Zurbrick, L.S., Lang, M.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Inspection of alternating phase-shift masks through the use of phase contrast techniques

Zurbrick, L.S., Rudzinski, M.W., Stokowski, S.E., He, L., Kimmel, K.R., Kashwala, N.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Alternating phase-shifting masks: phase determination and impact of quartz defects- theoretical and experimental results

Griesinger, U.A., Dettmann, W., Hennig, M., Heumann, J.P., Koehle, R., Ludwig, R., Verbeek, M., Zarrabian, M.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Alternating phase-shift mask inspection through the use of phase contrast enhancement techniques

Zurbrick, L.S., Rudzinski, M.W., Stokowski, S.E., He, L., Kimmel, K.R., Kashwala, N.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Defect inspection of quartz-PSMs: taking a leap forward

Heumann, J.P., Schurack, F., Dettmann, W., Zurbrick, L., Lang, M.

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Phase defect inspection of 130-nm node phase-shift masks using a simultaneous transmitted and reflected light pattern inspection algorithm

Zurbrick,L.S., Emery,D., Rudzinski,M.W., Wihl,M.J., Prudhomme,M., Crell,C., Griesinger,U.A., Vorwerk,M., Hennig,M.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Evaluation of printability and inspection of phase defects on hidden-shifter alternating phase-shift masks

Tenjil,E., Stivers,A.R., Schenker,R.E., Zurbrick,L.S.

SPIE - The International Society for Optical Engineering
5 Conference Proceedings Phase-enhanced DUV inspection of alternating phase-shift reticles

Zurbrick, L.S., Rudzinski, M., He, L., Kimmel, K.R., Williams, A.

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Qualification of alternating PSM: defect inspection analysis in comparison to wafer printing results

Dettmann, W., Heumann, J.P., Hagner, T., Koehle, R., Rahn, S., Verbeek, M., Zarrabian, M., Weckesser, J., Hennig, M., …

SPIE-The International Society for Optical Engineering
6 Conference Proceedings High-resolution ultraviolet defect inspection of DAP(darkfield alternate phase)reticles

Liebmann,L.W., Mansfield,S.M., Wong,A.K., Smolinski,J.G., Peng,S., Kimmel,K.R., Rudzinski,M.W., Wiley,J.N., …

SPIE - The International Society for Optical Engineering
12 Conference Proceedings Technological challenges in implementation of alternating phase-shift mask

Tsai,W., Qian,Q., Buckmann,K.M., Cheng,W.-H., He,L., Irvine,B., Kamna,M., Korobko,Y., Kovalchick,M., Labovitz,S.M., …

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12