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Evaluation of reticle cleaning performance with different drying methods for high-grade photomasks

Author(s):
Jeong,W.G. ( PKL )
Lee,S.W.
Kim,D.H.
Yoon,Y.J.
Lee,D.H.
Choi,B.Y.
Choi,S.-S.
Jung,S.M.
Jeong,S.-H.
4 more
Publication title:
21st Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4562
Pub. date:
2001
Vol.:
4562
Pt.:
One of Two Parts
Page(from):
99
Page(to):
110
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819442901 [0819442909]
Language:
English
Call no.:
P63600/4562
Type:
Conference Proceedings

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