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Loading effect parameters of dry etcher system and their analysis in mask-to-mask loading and within-mask loading

Author(s):
Kwon,H.-J. ( PKL )
Min,D.-S.
Jang,P.-J.
Chang,B.-S.
Choi,B.-Y.
Jeong,S.-H.
1 more
Publication title:
21st Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4562
Pub. Year:
2001
Vol.:
4562
Pt.:
One of Two Parts
Page(from):
79
Page(to):
87
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819442901 [0819442909]
Language:
English
Call no.:
P63600/4562
Type:
Conference Proceedings

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