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Extended capability of laser writer for masks beyond 180-nm nodes

Author(s):
Cho,S.-Y. ( Samsung Electronics Co., Ltd. )
Lee,J.-Y.
Kim,C.-H.
Choi,S.-W.
Han,W.-S.
Sohn,J.-M.
1 more
Publication title:
21st Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4562
Pub. Year:
2001
Vol.:
4562
Pt.:
One of Two Parts
Page(from):
9
Page(to):
15
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819442901 [0819442909]
Language:
English
Call no.:
P63600/4562
Type:
Conference Proceedings

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