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Improved microwave performance on low-resistivity Si substrates by introducing an oxidized porous Si interlayer

Author(s):
Publication title:
Micromachining and microfabrication process technology VII : 22-24 October 2001, San Francisco, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4557
Pub. Year:
2001
Page(from):
447
Page(to):
452
Pages:
6
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819442857 [0819442852]
Language:
English
Call no.:
P63600/4557
Type:
Conference Proceedings

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