Aberration correction for charged particle lithography
- Author(s):
- Munro,E. ( Munro's Electron Beam Software Ltd. )
- Zhu,X.
- Rouse,J.A.
- Liu,H.
- Publication title:
- Charged particle detection, diagnostics, and imaging : 30 July - 2 August 2001 San Diego, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4510
- Pub. Year:
- 2001
- Page(from):
- 218
- Page(to):
- 224
- Pages:
- 7
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819442246 [0819442240]
- Language:
- English
- Call no.:
- P63600/4510
- Type:
- Conference Proceedings
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