Thermal expansion and internal quality of a proposed EUVL mask substrate material: Zerodur | 東京工業大学附属図書館文献データベース

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Thermal expansion and internal quality of a proposed EUVL mask substrate material: Zerodur

Author(s):

Davis,M.J. ( Schott Glass Technologies Inc. )

Marker Ⅲ,A.J.

Publication title:

Inorganic optical materials III : 2 August, 2001, San Diego, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4452

Pub. Year:

2001

Page(from):

100

Page(to):

106

Pages:

7

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819441669 [081944166X]

Language:

English

Call no.:

P63600/4452

Type:

Conference Proceedings

Details

TDL ID:	ZA00012166
Series ID:	PA00000029
Conf. info. (Name):	Optics & Photonics : Inorganic optical materials
Conf. info. (Number):	2001 : 3rd
Conf. info. (Venue):	San Diego, CA, USA
Conf. info. (Date):	2001.08.02

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