High-resolution 157-nm imaging for lithography and micromachining applications

High-resolution 157-nm imaging for lithography and micromachining applications

Author(s):

Publication title:

Second International Symposium on Laser Precision Microfabrication : 16-18 May 2001, Singapore

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4426

Pub. Year:

2001

Page(from):

401

Page(to):

407

Pages:

7

Pub. info.:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819441379 [0819441376]

Language:

English

Call no.:

P63600/4426

Type:

Conference Proceedings

Details

TDL ID:	ZA00012140
Series ID:	PA00000029
Conf. info. (Name):	International Symposium on Laser Precision Microfabrication
Conf. info. (Number):	2000 : 2nd
Conf. info. (Venue):	Singapore
Conf. info. (Date):	2001.05.16-2001.05.18

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