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Acid-breakable-resin-based chemical amplification positive resist for 0.1-μm-rule reticle fabrication: design and lithographic performance

Author(s):
Migitaka,S. ( Hitachi, Ltd. )
Arai,T.
Sakamizu,T.
Kasuya,K.
Hashimoto,M.
Shiraishi,H.
1 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology VIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4409
Pub. Year:
2001
Page(from):
341
Page(to):
350
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819441119 [0819441112]
Language:
English
Call no.:
P63600/4409
Type:
Conference Proceedings

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