High-performance e-beam resist coupling excellent dry etch resistance and sub-100-nm resolution for advanced mask making | 東京工業大学附属図書館文献データベース

Blank Cover Image

High-performance e-beam resist coupling excellent dry etch resistance and sub-100-nm resolution for advanced mask making

Author(s):

Huang,W.-S. ( IBM Microelectronics )

Mahorowala,A.P.

Angelopoulos,M.

Publication title:

Photomask and Next-Generation Lithography Mask Technology VIII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4409

Pub. Year:

2001

Page(from):

287

Page(to):

297

Pages:

11

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819441119 [0819441112]

Language:

English

Call no.:

P63600/4409

Type:

Conference Proceedings

Details

TDL ID:	ZA00012125
Series ID:	PA00000029
Conf. info. (Name):	Photomask and next-generation lithography mask technology
Conf. info. (Number):	2001 : 8th
Conf. info. (Venue):	Yokohama, Japan
Conf. info. (Date):	2001.04.25-2001.04.27

Similar Items:

1 Conference Proceedings High-performance e-beam resist coupling excellent dry etch resistance and sub-100-nm resolution for advanced mask and device making Huang,W.-S., Kwong,R.W., Moreau,W.M., Lang,R., Robinson,C.F., Medeiros,D.R., Petrillo,K.E., Aviram,A., Mahorowala,A.P., … SPIE-The International Society for Optical Engineering	7 Conference Proceedings CA resist with high sensitivity and sub-100-nm resolution for advanced mask making Huang,W.-S., Kwong,R.W., Hartley,J.G., Moreau,W.M., Angelopoulos,M., Magg,C., Lawliss,M. SPIE - The International Society for Optical Engineering
2 Conference Proceedings Applicaton of blends and side chain Si-O copolymers as high-etch resistant sub-100-nm E-beam resists Huang, W.-S., Kwong, R.W., Moreau, W.M., Lang, R., Medeiros, D.R., Petrillo, K.E., Mahorowala, A.P., Angelopoulos, M., … SPIE-The International Society for Optical Engineering	8 Conference Proceedings Highly etch-selective spin-on bottom antireflective coating for use in 193-nm lithography and beyond Pfeiffer, D., Mahorowala, A.P., Babich, K., Medeiros, D.R., Petrillo, K.E., Angelopoulos, M., Huang, W.-S., Halle, S., … SPIE-The International Society for Optical Engineering
3 Conference Proceedings Extending the performance of KRS-XE for high-throughput electron-beam lithography for advanced mask making Medeiros,D.R., Petrillo,K.E., Bucchignano,J., Angelopoulos,M., Huang,W.-S., Li,W., Moreau,W.M., Lang,R., Kwong,R.W., … SPIE-The International Society for Optical Engineering	9 Conference Proceedings High-resolution patterning in chemically amplified resists: the effect of film thickness Medeiros,D.R., Moreau,W.M., Petrillo,K.E., Chauhan,M., Huang,W.-S., Magg,C., Goldfarb,D., Angelopoulos,M., Nealey,P.F. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Current developments of a high-performance CA resist for mask-making application Huang, W.-S., He, W., Li, W., Moreau, W.M., Lang, R., Medeiros, D.R., Petrillo, K.E., Mahorowala, A.P., Angelopoulos, … SPIE-The International Society for Optical Engineering	10 Conference Proceedings Enhancement of KRS-XE for 50-keV advanced mask-making applications Petrillo, K.E., Medeiros, D.R., Buccohignano, J., Angelopoulos, M., Goldfarb, D.L., Huang, W.-S., Moreau, W.M., Lang, … SPIE-The International Society for Optical Engineering
5 Conference Proceedings CA resist with high sensitivity and sub-100-nm resolution for advanced mask and device making Kwong,R.W., Huang,W.-S., Hartley,J.G., Moreau,W.M., Robinson,C., Angelopoulos,M., Magg,C., Lawliss,M. SPIE - The International Society for Optical Engineering	11 Conference Proceedings Impact of thin resist processes on post-etch LER Mahorowala, A.P., Goldfarb, D.L., Temple, K., Petrillo, K.E., Pfeiffer, D., Babich, K., Angelopoulos, M., Gallatin, … SPIE-The International Society for Optical Engineering
6 Conference Proceedings High-contrast positive resists for e-beam mask making Huang,W.-S., Kwong,R.W., Moreau,W.M., Angelopoulos,M., Bucchiagnano,J., Petrillo,K.E., Ito,H. SPIE - The International Society for Optical Engineering	12 Conference Proceedings A new high performance CA resist for E-beam lithography Kwong, Ranee, Huang, Wu-Song, Moreau, Wayne, Lang, Robert, Robinson, Christopher, Medeiros, David R., Aviram, Ari, … MRS-Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12