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Advanced e-beam reticle writing system for next-generation reticle fabrication

Author(s):
Fujii,A. ( Hitachi, Ltd. )
Mizuno,K.
Nakahara,T.
Asai,S.
Kadowaki,Y.
Shimada,H.
Touda,H.
Iizumi,K.
Takahashi,H.
Oonuki,K.
Kawahara,T.
Kawasaki,K.
Nagata,K.
Satoh,H.
9 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology VIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4409
Pub. Year:
2001
Page(from):
258
Page(to):
269
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819441119 [0819441112]
Language:
English
Call no.:
P63600/4409
Type:
Conference Proceedings

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