Blank Cover Image

Laser proximity correction for advanced mask manufacturing

Author(s):
Chang,M. ( Toppan Chunghwa Electronics Co., Ltd. )
Yu,A.
Chen,J.
Lin,J.
Huang,J.
Hsu,F.
Liu,H.
2 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology VIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4409
Pub. Year:
2001
Page(from):
221
Page(to):
227
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819441119 [0819441112]
Language:
English
Call no.:
P63600/4409
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Two threshold resist models for optical proximity correction

Huang, W.-C., Lin, C.-H., Kuo, C.-C., Huang, C.C., Lin, J.F., Chen, J.-H., Liu, R.-G., Ku, Y.C., Lin, B.-J.

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Lihtography process optimization for 130-nm polygate mask and the impact of mask error factor

Hsu,S., Shi,X., Socha,R.J., Chen,J.F., Yee,J.C., Anath,M., Desai,S., Imamura,P.H., Sherrill,M.J., Tseng,Y.C., …

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Effects of advanced illumination schemes on design manufacturability and interactions with optical proximity corrections

Capodieci,L., Torres,J.A., Socha,R.J., Hollerbach,U., Chen,J.F., Os,C.van, Granik,Yu., Toublan,O., Cobb,N.B.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Practical approach for AAPSM image imbalance correction for sub-100-nm lithography

Cho, H.L., Lin, S.Y., Hsieh, F., Kroyan, A., Liu, H.-Y., Huang, J.H., Hsu, S.-H., Huang, I-H., Lin, B.S.-M., Hung, K.-C.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Implementing AAPSM in 90-nm product with practical image imbalance correction

Lin, B.S., Hsu, S.-, Huang, I.H., Chen, K., Hsieh, F., Hsu, T., Liu, H.-Y., Kroyan, A., Hsu, F., Huang, J.

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Incorporation of laser proximity correction into mask production

Rosenbusch,A., Unruh,J., Kirsch,H., Chan,D.

SPIE - The International Society for Optical Engineering
4 Conference Proceedings Global CD uniformity improvement in mask manufacturing for advanced lithography

Chang, S.-M., Chin, C.C., Wang, W.-C., Lu, C.-L., Hsieh, R.-G., Tsay, C.-S., Yen, Y.-S., Chin, S.-C., Lee, H.-C., Liu, …

SPIE - The International Society of Optical Engineering
10 Conference Proceedings ⅠⅠⅠ-V MOSFET's with Advanced High k Dielectrics

M. Hong, J. Kwo, C. P. Chen, Y. C. Chang, M. L. Huang, C. F. Lin

Electrochemical Society
5 Conference Proceedings Optimal proximity correction: application for flash memory design

Chen,Y.G., Huang,D.L., Sung,K.T., Chiang,J.J., Yu,M., Teng,F., Chu,L., Rey,J.C., Bernard,D.A., Li,J., Moroz,V., …

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Impact of pattern proximity correction on die-to-database mask inspection

Rosenbusch,A., Bailey,V., Eran,Y., Falah,F., Hamar,S., Holmes,H.J., Hound,A.C., Kirsch,H., McArthur,A.

SPIE - The International Society for Optical Engineering
6 Conference Proceedings Phase aware proximity correction for advanced masks

Toublan,O., Sahouria,E.Y., Cobb,N.B., Do,T., Donnelly,T., Granik,Y., Schellenberg,F.M., Schiavone,P.

SPIE - The International Society for Optical Engineering
12 Conference Proceedings Defect dispositiong using mask printability analysis on alternating phase-shifting masks

Chang, C.-H., Hsieh, C.-H., Tzu, S.-D., Dai, C.-M., Lin, B. J., Pang, L., Qian, Q.-D., Chen, J.-H., Huang, J. H.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12