Reticle quality needs for advanced 193-nm lithography
- Author(s):
- Publication title:
- Photomask and Next-Generation Lithography Mask Technology VIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4409
- Pub. Year:
- 2001
- Page(from):
- 108
- Page(to):
- 117
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819441119 [0819441112]
- Language:
- English
- Call no.:
- P63600/4409
- Type:
- Conference Proceedings
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