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Reticle quality needs for advanced 193-nm lithography

Author(s):
Publication title:
Photomask and Next-Generation Lithography Mask Technology VIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4409
Pub. date:
2001
Vol.:
4409
Page(from):
108
Page(to):
117
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819441119 [0819441112]
Language:
English
Call no.:
P63600/4409
Type:
Conference Proceedings

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