Etch selectivity of a wet chemical formulation for premetal cleaning

Etch selectivity of a wet chemical formulation for premetal cleaning

Author(s):

Epton,J.W. ( Rockwood Electronic Materials )
Jarrett,D.L.
Doohan,I.J.

Publication title:

Process and equipment control in microelectronic manufacturing II : 30-31 May, 2001, Edinburgh, UK

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4405

Pub. Year:

2001

Page(from):

105

Page(to):

116

Pages:

12

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819441065 [0819441066]

Language:

English

Call no.:

P63600/4405

Type:

Conference Proceedings

Details

TDL ID:	ZA00012121
Series ID:	PA00000029
Conf. info. (Name):	Microelectronic Manufacturing Technologies : Process and Equipment Control in Microelectronic Manufacturing
Conf. info. (Number):	2001 : 2nd
Conf. info. (Venue):	Edinburgh, UK
Conf. info. (Date):	2001.05.30-2001.05.31

Similar Items:

1 Conference Proceedings The Effect of Delay Between Dry Etch and Wet Clean Processing Steps on Cleaning of Post-Etch Residues D. Hellin, I.J. Vos, G. Vereecke, E. Pavel, W. Boullart Electrochemical Society	7 Conference Proceedings Continuous wave (cw) hf overtone chemical laser L.H. Sentman, D.L. Carroll, P.T. Theodoropoulos, J.W. Otto, S.J. Gordon Society of Photo-optical Instrumentation Engineers
2 Conference Proceedings PHOTOLUMINESCENCE AND STRUCTURE OF CHEMICALLY ETCHED Si Shih, S., Jung, K.H., Hsieh, T.Y., Sarathy, J., Tsai, C., Li, K.-H., Campbell, J.C., Kwong, D.L. Materials Research Society	8 Conference Proceedings 4 Molecular Dymanics/Electronic Structure Calculations of the Metal-Electrolyte Interface Price, D.L., Halley, J.W. Electrochemical Society
3 Conference Proceedings INTEGRATION OF HIGH-k GATE DIELECTRICS - WET ETCH CLEANING AND SURFACE CONDITIONING De Gendt, S., Beckx, S., Caymax, M., Claes, M., Conard, T., Delabie, A., Deweerd, W., Hellin, D., Kraus, H., Onsia, B., … Electrochemical Society	9 Conference Proceedings THE BEHAVIOR OF OZONE IN WET CLEANING CHEMICAlS Park, J.-G., Han, J.-H. Electrochemical Society
4 Conference Proceedings Wet and Dry Etch Selectivity For the GaAs/AlGaAs and GaAs/InGaP Systems Hays, D., Abernathy, C.R., Pearton, S.J., Ren, F., Hobson, W.S. Electrochemical Society	10 Conference Proceedings Wet Etch Characteristics of Hafnium Silicate Layers M. Claes, V. Paraschiv, D. Dictus, T. Conard, W. Boullari, S. Vanhaelemeersch, S. De Gendt, A. Delabie, S. Van … Electrochemical Society
5 Conference Proceedings SELECTIVE AREA DEPOSITION OF PASSIVANTS, INSULATORS, AND EPITAXIAL FILMS OF II-VI COMPOUND SEMICONDUCTORS Dreifus, D.L., Lansari, Y., Han, J.W., Hwang, S., Cook, Jr., J.W., Schetzina, J.F. Materials Research Society	11 Conference Proceedings COMPARISON OF VAPOR-PHASE AND WET CHEMICAL PRE-GATE OXIDE AND PRE-CONTACT CLEANS Draper, C.W., Anyanwu, V.E., Eisenberg, J.H., Felton, G.J., Roy, P.K., Chittipeddi, S., Bechtold, P.F., Hagner, G., … Electrochemical Society
6 Conference Proceedings New Process Technique of AlGaAs/GaAs Wet Chemically Etched Mirror Lasers Karouta, F., van den Heuvel, H.H.P.M., van Hassel, J.G., Wellen, J.S., Smalbrugg, E., Stegeman, J.A.A., Kaufmann, … Electrochemical Society	12 Conference Proceedings VISIBLE PHOTOLUMINESCENCE AND MICROSTRUCTURE OF ANNEALED AND CHEMICALLY ETCHED AMORPHOUS Si Jung, K.H., Shih, S., Kwong, D.L., Cho, C.C., Gnade, B.E. Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12