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Final CD control through slope/sidewall angle correlation with stepper defocus and electrical parametric

Author(s):
Publication title:
Process and equipment control in microelectronic manufacturing II : 30-31 May, 2001, Edinburgh, UK
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4405
Pub. Year:
2001
Page(from):
91
Page(to):
99
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819441065 [0819441066]
Language:
English
Call no.:
P63600/4405
Type:
Conference Proceedings

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