0.11-μm imaging in KrF lithography using dipole illumination
- Author(s):
Eurlings,M. ( ASML ) Setten,E.van Torres,J.A. Dusa,M.V. Socha,R.J. Capodieci,L. Finders,J. - Publication title:
- Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4404
- Pub. Year:
- 2001
- Page(from):
- 266
- Page(to):
- 278
- Pages:
- 13
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819441058 [0819441058]
- Language:
- English
- Call no.:
- P63600/4404
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society for Optical Engineering |
7
Conference Proceedings
Comparison of OPC rules and common process windows for 130-nm features using binary and attenuated phase-shift masks
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
8
Conference Proceedings
Development of a sub-100nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination
SPIE-The International Society for Optical Engineering |
3
Conference Proceedings
CD control comparison for sub-0.18-ヲフm patterning using 248-nm lithography and strong resolution enhancement techniques
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
5
Conference Proceedings
Dipole decomposition mask design for full-chip implementation at 100-nm technology node and beyond
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
Comprehensive metrology-detection strategies for sub-0.5-µm lithography reticles
Society of Photo-optical Instrumentation Engineers |
6
Conference Proceedings
Effects of advanced illumination schemes on design manufacturability and interactions with optical proximity corrections
SPIE-The International Society for Optical Engineering |
12
Conference Proceedings
Application of CPL with Interference Mapping Lithography to generate random contact reticle designs for the 65-nm node
SPIE - The International Society of Optical Engineering |