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Critical procedure for OPC software benchmarking with maskshop consideration

Author(s):
Barberet,A. ( DuPont Photomasks SA )
Galan,G.
Fanget,G.L.
Richoilley,J.-C.
Tissier,M.
Quere,Y.
1 more
Publication title:
Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4404
Pub. Year:
2001
Page(from):
188
Page(to):
199
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819441058 [0819441058]
Language:
English
Call no.:
P63600/4404
Type:
Conference Proceedings

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