"ArF lithography: challenges, resolution capability, and the mask error enhancement function"
- Author(s):
- Plat,M.V. ( Advanced Micro Devices, Inc. )
- Lyons,C.F.
- Wilkison,A.
- Schefske,J.A.
- Kim,H.-E.
- Publication title:
- Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4404
- Pub. Year:
- 2001
- Page(from):
- 162
- Page(to):
- 169
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819441058 [0819441058]
- Language:
- English
- Call no.:
- P63600/4404
- Type:
- Conference Proceedings
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