Charged-particle-beam-induced processes and their applicability to mask repair for next-generation lithographies

Charged-particle-beam-induced processes and their applicability to mask repair for next-generation lithographies

Author(s):: Koops,H.W.P. ( T-NOVA Deutsche Telekom )
Publication title:: 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Title of ser.:: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:: 4349
Pub. Year:: 2000
Page(from):: 175
Page(to):: 179
Pages:: 5
Pub. info.:: Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:: 0277786X
ISBN:: 9780819440396 [0819440396]
Language:: English
Call no.:: P63600/4349
Type:: Conference Proceedings

Details

TDL ID:	ZA00012065
Series ID:	PA00000029
Conf. info. (Name):	European Mask and Lithography Conference : European Conference on Mask Technology for Integrated Circuits and Microcomponents
Conf. info. (Number):	2000 : 17th
Conf. info. (Venue):	Munich, Germany
Conf. info. (Date):	2000.11.13-2000.11.14

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