Blank Cover Image

Mask manufacturing contribution on 248-nm and 193-nm lithography performances

Author(s):
Publication title:
17th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4349
Pub. Year:
2000
Page(from):
90
Page(to):
98
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440396 [0819440396]
Language:
English
Call no.:
P63600/4349
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Mask manufacturing contribution on 248-nm and 193-nm lithography performances

Barberet,A., Fanget,G.L., Richoilley,J.-C., Tissier,M., Quere,Y.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Positive bilayer resists for 248-and 193-nm lithography

Sooriyakumaran,R., Wallraff,G.M., Larson,C.E., Fenzel-Alexander,D., DiPietro,R.A., Opitz,J., Hofer,D.C., …

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Adjustment of optical proximity correction (OPC) software for mask process correction (MPC): Module 2. Lithography simulation based on optical mask writing tool …

Barberet, A., Buck, P.D., Fanget, G.L., Toublan, O., Richoilley, J.-C., Tissier, M.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Effect of mask pattern fidelity on 193-nm lithography performance

Cheng, C.C., Su, T.-L., Tsai, F.-G., Tsai, T.-H., Tu, C.-C., Yoo, C.-S.

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Critical procedure for OPC software benchmarking with maskshop consideration

Barberet,A., Galan,G., Fanget,G.L., Richoilley,J.-C., Tissier,M., Quere,Y.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Designing dual-trench alternating phase-shift masks for 140-nm and smaller features using 248-nm KrF and 193-nm ArF lithography

Petersen,J.S., Socha,R.J., Naderi,A.R., Baker,C.A., Rizvi,S.A., BanDenBroeke,D., Kachwala,N., Chen,F., Laiding,S., …

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Adjustment of optical proximity correction (OPC) software for mask process correction (MPC). Module 1: Optical mask writing tool simulation

Barberet,A., Fanget,G.L., Buck,P.D., Toublan,O., Richoilley,J.-C., Tissier,M.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Practicing extension of 248-nm DUV optical lithography using trim-mask PSM

Kling,M.E., Cave,N., Falch,B.J., Fu,C.-C., Green,K.G., Lucas,K.D., Roman,B.J., Reich,A.J., Sturtevant,J.L., Tian,R., …

SPIE - The International Society for Optical Engineering
5 Conference Proceedings 193-nm scanner characterization by SEM and electrical CD measurements

Pain,L., Trouiller,Y., Barberet,A., Guirimand,O., Fanget,G.L., Martin,N., Quere,Y., Nier,M.E., Lajoinie,E., Louis,D., …

SPIE - The International Society for Optical Engineering
11 Conference Proceedings Lithographic characteristics of 193-nm resists imaged at 193 and 248 nm

Opitz,J., Allen,R.D., Wallow,T.I., Wallraff,G.M., Hofer,D.C.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings ArF lithography for printing 100-nm gates on low-volume ASIC devices: CD budget issues related to various binary mask-making processes

Trouiller,Y., Fanget,G.L., Miramond,C., Rody,Y.F.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings A comparative study for mask defect tolerance on phase and transmission for dry and immersion 193-nm lithography

M. L. Ling, G. S. Chua, C. J. Tay, C. Quan, Q. Lin

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12