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First results from a new 248-nm CD measurement system for future mask and reticle generation

Author(s):
Publication title:
17th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4349
Pub. Year:
2000
Page(from):
73
Page(to):
77
Pages:
5
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440396 [0819440396]
Language:
English
Call no.:
P63600/4349
Type:
Conference Proceedings

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