Doubly exposed patterning characteristics using two alternating phase-shift masks

Doubly exposed patterning characteristics using two alternating phase-shift masks

Author(s):

Lee,S.-W. ( Samsung Electronics Co., Ltd. )

Publication title:

17th European Conference on Mask Technology for Integrated Circuits and Microcomponents

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4349

Pub. Year:

2000

Page(from):

32

Page(to):

36

Pages:

5

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819440396 [0819440396]

Language:

English

Call no.:

P63600/4349

Type:

Conference Proceedings

Details

TDL ID:	ZA00012065
Series ID:	PA00000029
Conf. info. (Name):	European Mask and Lithography Conference : European Conference on Mask Technology for Integrated Circuits and Microcomponents
Conf. info. (Number):	2000 : 17th
Conf. info. (Venue):	Munich, Germany
Conf. info. (Date):	2000.11.13-2000.11.14

Similar Items:

1 Conference Proceedings Doubly exposed patterning using mutually one-pitch step-shifted alternating phase-shift masks Lee,S.-W., Chung,D.-H., Shin,I.-G., Kim,Y.-H., Choi,S.-W., Han,W.-S., Sohn,J.-M. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Phase-shifted assist feature OPC for sub-45-nm node optical lithography G. Yoon, H. Kim, J. Lee, S. Choi, W. Han SPIE - The International Society of Optical Engineering
2 Conference Proceedings Effect of mask reduction ratio in alternating phase-shift masks Shin,I.-G., Lee,S.-W., Kim,Y.-H., Choi,S.-W., Han,W.-S., Sohn,J.-M., Lim,T.-K. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Pattern-dependence optical phase effect on alternating phase shift mask Chang, B.-C., You, J.-W., Lu, M., Lee, C.-L., Kung, L.-W., Shu, K.-C., Shin, J.-J., Gau, T.-S., Lin, B.J. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Analytical approach to X-phenomenon in alternating phase-shifting masks Park, J.R., Kim, S.-H., Lee, H.-J., Jang, I.-Y., Choi, Y.-H., Yang, S.-H., Lee, Y.-H., Kim, Y.-H., Choi, S.-W., Yoon, … SPIE-The International Society for Optical Engineering	9 Conference Proceedings Optimization of alternating phase shifting mask structure Cha,H.-S., Choi,S.-J., Yoon,S.-Y., Jung,S.-M., Choi,S.-S., Jeong,S.-H. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Feasibility evaluations of alternating phase-shift mask for imaging sub-80nm feature with KrF Kang, M.-A., Kim, S.-H., Shin, I.-K., Choi, S.-W., Sohn, J.-M. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Study of Cr patch validity for ArF CPL mask and its fabrication Kim, C.-H., Kim, S.-H., Lee, M.-S., Park, J.-S., Shin, I.-G., Choi, S.-W., Yoon, H.-S., Han, W.-S. SPIE - The International Society of Optical Engineering
5 Conference Proceedings Fidelity comparison of island patterns with different types of illuminations and phase shift masks S.-Y. Moon, W.-S. Han, S.-G. Woo, C.-J. Sohn, C.-H. Kim Society of Photo-optical Instrumentation Engineers	11 Conference Proceedings Application of alternating phase-shifting masks to sub-quarter-micrometer contact holes Lim,S.-C., Kye,J.-W., Woo,S.-G., Kim,S.-G., Kang,H.-Y., Han,W.-S., Koh,Y.-B. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Application of alternating phase shift mask to device fabrication S.-G. Kim, S.-G. Woo, W.-S. Han, Y.-B. Koh, M.-Y. Lee Society of Photo-optical Instrumentation Engineers	12 Conference Proceedings Characteristics of RIE lag and pattern density effect in alternating aperture phase-shift masks [5992-126] Chang, B. -S., Chang, Y. -Y., Bang, S. -H., Lee, I. -S., Kim, L. -J., Ahn, C.-N., Kim, H. -S. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12