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Doubly exposed patterning characteristics using two alternating phase-shift masks

Author(s):
Lee,S.-W. ( Samsung Electronics Co., Ltd. )
Shin,I.-G.
Kim,Y.-H.
Choi,S.-W.
Han,W.-S.
Yoon,H.-S.
Sohn,J.-M.
2 more
Publication title:
17th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4349
Pub. date:
2000
Vol.:
4349
Page(from):
32
Page(to):
36
Pages:
5
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440396 [0819440396]
Language:
English
Call no.:
P63600/4349
Type:
Conference Proceedings

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