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Application of the aberration ring test (ARTEMIS) to determine lens quality and predict its lithographic performance

Author(s):
Moers,M.H. ( ASML )
Laan,H.van der
Zellenrath,M.
Boeij,W.de
Beaudry,N.A.
Cummings,K.D.
Zwol,A.van
Becht,A.
Willekers,R.
4 more
Publication title:
Optical Microlithography XIV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4346
Pub. Year:
2001
Vol.:
4346
Pt.:
Two of Two Parts
Page(from):
1379
Page(to):
1387
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440327 [0819440329]
Language:
English
Call no.:
P63600/4346
Type:
Conference Proceedings

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