193 lithography and RELACS processing for BEOL lithography
- Author(s):
DellaGuardia,R. ( IBM Corp. ) Petrillo,K.E. Chen,J. Rabidoux,P. Dalton,T.J. Holmes,S.J. Hadel,L.M. Malone,K. Mahorowala,A.P. Greco,S. Ferguson,R.A. - Publication title:
- Optical Microlithography XIV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4346
- Pub. Year:
- 2001
- Vol.:
- 4346
- Pt.:
- Two of Two Parts
- Page(from):
- 1029
- Page(to):
- 1040
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440327 [0819440329]
- Language:
- English
- Call no.:
- P63600/4346
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
When is bilayer thin-film imaging suitable: comparison with single-layer resists
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
Methods for comparing contact hole shrinking techniques with 248-nm single layer and bilayer photoresists
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
Highly etch-selective spin-on bottom antireflective coating for use in 193-nm lithography and beyond
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Current developments of a high-performance CA resist for mask-making application
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
9
Conference Proceedings
Silicon containing polymer in applications for 193-nm high-NA lithography processes [6153-20]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
Tunable antireflective coatings with built-in hard mask properties facilitating thin-resist processing
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
12
Conference Proceedings
Applicaton of blends and side chain Si-O copolymers as high-etch resistant sub-100-nm E-beam resists
SPIE-The International Society for Optical Engineering |