When is bilayer thin-film imaging suitable: comparison with single-layer resists | 東京工業大学附属図書館文献データベース

Blank Cover Image

When is bilayer thin-film imaging suitable: comparison with single-layer resists

Author(s):

Halle,S. ( IBM Microelectronics )

Mahorowala,A.P.

Angelopoulos,M.

Publication title:

Optical Microlithography XIV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4346

Pub. Year:

2001

Vol.:

4346

Pt.:

Two of Two Parts

Page(from):

970

Page(to):

981

Pages:

12

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819440327 [0819440329]

Language:

English

Call no.:

P63600/4346

Type:

Conference Proceedings

Details

TDL ID:	ZA00012062
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2001 : 14th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2001.02.27-2001.03.02

Similar Items:

1 Conference Proceedings Tunable antireflective coatings with built-in hard mask properties facilitating thin-resist processing Mahorowala,A.P., Babich,K., Petrillo,K.E., Simons,J.P., Angelopoulos,M., Patel,V., Grill,A., Halle,S., Conti,R., … SPIE-The International Society for Optical Engineering	7 Conference Proceedings Impact of thin resist processes on post-etch LER Mahorowala, A.P., Goldfarb, D.L., Temple, K., Petrillo, K.E., Pfeiffer, D., Babich, K., Angelopoulos, M., Gallatin, … SPIE-The International Society for Optical Engineering
2 Conference Proceedings Hardmask technology for sub-100 nm lithographic imaging Babich, K., Mahorowala, A.P., Medeiros, D.R., Pfeiffer, D., Petrillo, K.E., Angelopoulos, M., Grill, A., Patel, V., … SPIE-The International Society for Optical Engineering	8 Conference Proceedings Positive bilayer resists for 248-and 193-nm lithography Sooriyakumaran,R., Wallraff,G.M., Larson,C.E., Fenzel-Alexander,D., DiPietro,R.A., Opitz,J., Hofer,D.C., … SPIE-The International Society for Optical Engineering
3 Conference Proceedings Highly etch-selective spin-on bottom antireflective coating for use in 193-nm lithography and beyond Pfeiffer, D., Mahorowala, A.P., Babich, K., Medeiros, D.R., Petrillo, K.E., Angelopoulos, M., Huang, W.-S., Halle, S., … SPIE-The International Society for Optical Engineering	9 Conference Proceedings Applicaton of blends and side chain Si-O copolymers as high-etch resistant sub-100-nm E-beam resists Huang, W.-S., Kwong, R.W., Moreau, W.M., Lang, R., Medeiros, D.R., Petrillo, K.E., Mahorowala, A.P., Angelopoulos, M., … SPIE-The International Society for Optical Engineering
4 Conference Proceedings Effects of underlayer on performance of bilayer resists for 248-nm lithography Babich,K., Callegari,A., Petrillo,K.E., Simons,J.P., LaTulipe,D.C.,Jr., Angelopoulos,M., Lin,Q. SPIE-The International Society for Optical Engineering	10 Conference Proceedings New family of non-chemically amplified resists Aviram,A., Angelopoulos,M., Babich,E.D., Babich,I.V., Petrillo,K., Seeger,D.E. SPIE-The International Society for Optical Engineering
5 Conference Proceedings 193 lithography and RELACS processing for BEOL lithography DellaGuardia,R., Petrillo,K.E., Chen,J., Rabidoux,P., Dalton,T.J., Holmes,S.J., Hadel,L.M., Malone,K., Mahorowala,A.P., … SPIE-The International Society for Optical Engineering	11 Conference Proceedings High-performance e-beam resist coupling excellent dry etch resistance and sub-100-nm resolution for advanced mask and device making Huang,W.-S., Kwong,R.W., Moreau,W.M., Lang,R., Robinson,C.F., Medeiros,D.R., Petrillo,K.E., Aviram,A., Mahorowala,A.P., … SPIE-The International Society for Optical Engineering
6 Conference Proceedings High-resolution 248-nm bilayer resist Lin, Q., Petrillo, K. E., Babich, K., Tulipe, D. C. La, Medeiros, D., Mahorowala, A., Simons, J. P., Angelopoulos, M., … SPIE - The International Society of Optical Engineering	12 Conference Proceedings Current developments of a high-performance CA resist for mask-making application Huang, W.-S., He, W., Li, W., Moreau, W.M., Lang, R., Medeiros, D.R., Petrillo, K.E., Mahorowala, A.P., Angelopoulos, … SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12