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100-nm gate lithography for double-gate transistors

Author(s):
Krasnoperova,A.A. ( IBM Thomas J. Watson Research Ctr. )
Zhang,Y.
Babich,I.V.
Treichler,J.
Yoon,J.H.
Guarini,K.
Solomon,P.M.
2 more
Publication title:
Optical Microlithography XIV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4346
Pub. Year:
2001
Vol.:
4346
Pt.:
Two of Two Parts
Page(from):
925
Page(to):
935
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440327 [0819440329]
Language:
English
Call no.:
P63600/4346
Type:
Conference Proceedings

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