Effects of mask bias on the mask error enhancement factor (MEEF) of contact holes
- Author(s):
- Kang,D. ( Shipley Co. )
- Robertson,S.A.
- Reilly,M.T.
- Pavelchek,E.K.
- Publication title:
- Optical Microlithography XIV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4346
- Pub. Year:
- 2001
- Vol.:
- 4346
- Pt.:
- Two of Two Parts
- Page(from):
- 858
- Page(to):
- 868
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440327 [0819440329]
- Language:
- English
- Call no.:
- P63600/4346
- Type:
- Conference Proceedings
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