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Novel Si-based composite thin films for 193/157-nm attenuated phase-shift mask (APSM) applications

Author(s):
Chey,S.J. ( IBM Thomas J. Watson Research Ctr. )
Guarnieri,C.R.
Babich,K.
Pope,K.R.
Goldfarb,D.
Angelopoulos,M.
Racette,K.C.
Hibbs,M.S.
Gibson,M.L.
Kimmel,K.R.
5 more
Publication title:
Optical Microlithography XIV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4346
Pub. Year:
2001
Vol.:
4346
Pt.:
One of Two Parts
Page(from):
798
Page(to):
805
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440327 [0819440329]
Language:
English
Call no.:
P63600/4346
Type:
Conference Proceedings

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