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Feasibility study on the ArF attenuated phase-shift mask for 100-nm node lithography

Author(s):
Koo,S.-S. ( Hyundai Electronics Industries Co., Ltd. )
Kim,S.-J.
Paek,S.-W.
Ahn,C.-N.
Ham,Y.-M.
Shin,K.-S.
1 more
Publication title:
Optical Microlithography XIV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4346
Pub. date:
2001
Vol.:
4346
Pt.:
One of Two Parts
Page(from):
770
Page(to):
777
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440327 [0819440329]
Language:
English
Call no.:
P63600/4346
Type:
Conference Proceedings

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