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Doubly exposed patterning using mutually one-pitch step-shifted alternating phase-shift masks

Author(s):
Lee,S.-W. ( Samsung Electronics Co., Ltd. )
Chung,D.-H.
Shin,I.-G.
Kim,Y.-H.
Choi,S.-W.
Han,W.-S.
Sohn,J.-M.
2 more
Publication title:
Optical Microlithography XIV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4346
Pub. date:
2001
Vol.:
4346
Pt.:
One of Two Parts
Page(from):
762
Page(to):
769
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440327 [0819440329]
Language:
English
Call no.:
P63600/4346
Type:
Conference Proceedings

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