High-numerical-aperture 193-nm exposure tool
- Author(s):
Sewell,H. ( SVG Lithography Systems, Inc. ) Cote,D.R. Williamson,D.M. Oskotsky,M.L. Sakin,L. O'Neil,T. Zimmerman,J.D. Zimmerman,R. Nelson,M. Mason,C.J. Ahouse,D. Harrold,H.G. Lamastra,P. Callan,D. - Publication title:
- Optical Microlithography XIV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4346
- Pub. Year:
- 2001
- Vol.:
- 4346
- Pt.:
- One of Two Parts
- Page(from):
- 606
- Page(to):
- 620
- Pages:
- 15
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440327 [0819440329]
- Language:
- English
- Call no.:
- P63600/4346
- Type:
- Conference Proceedings
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