Alternating phase-shifting mask with reduced aberration sensitivity: lithography considerations
- Author(s):
- Wong,A.K. ( Univ. of Hong Kong )
- Liebmann,L.W.
- Molless,A.F.
- Publication title:
- Optical Microlithography XIV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4346
- Pub. Year:
- 2001
- Vol.:
- 4346
- Pt.:
- One of Two Parts
- Page(from):
- 420
- Page(to):
- 428
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440327 [0819440329]
- Language:
- English
- Call no.:
- P63600/4346
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Method to determine printability of photomask defects and its use in phase-shift mask evaluations
SPIE - The International Society for Optical Engineering |
7
Conference Proceedings
Understanding across-chip line-width variation:the first step toward optical proximity correction
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
Theoretical discussion on reduced aberration sensitivity of enhanced alternating phase-shifting masks
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Methodology for generating exposure tool specifications for alternating phase-shift mask application for 70-nm node
SPIE-The International Society for Optical Engineering |
3
Conference Proceedings
Pattern-dependent correction of mask topography effects for alternating phase-shifting masks
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Alternating phase-shifted mask for logic gate levels,design,and mask manufacturing
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
Resolution enhancement techniques in optical lithography: It's not just a mask problem
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
12
Conference Proceedings
High-resolution ultraviolet defect inspection of DAP(darkfield alternate phase)reticles
SPIE - The International Society for Optical Engineering |