Measurement of transmittance variation of projection lenses depending on the light paths using a grating-pinhole mask

Measurement of transmittance variation of projection lenses depending on the light paths using a grating-pinhole mask

Author(s):

Sato,K. ( Toshiba Corp. )
Inoue,S.

Publication title:

Optical Microlithography XIV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4346

Pub. Year:

2001

Vol.:

4346

Pt.:

One of Two Parts

Page(from):

379

Page(to):

386

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819440327 [0819440329]

Language:

English

Call no.:

P63600/4346

Type:

Conference Proceedings

Details

TDL ID:	ZA00012062
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2001 : 14th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2001.02.27-2001.03.02

Similar Items:

1 Conference Proceedings Measurement of effective source shift using a grating-pinhole mask Sato,K., Tanaka,S., Fujisawa,T., Inoue,S. SPIE - The International Society for Optical Engineering	7 Conference Proceedings Resist footing variation and compensation over nonplanar wafer Sato, T., Endo, A., Hashimoto, K., Inoue, S., Shibata, T., Kobayashi, Y. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Impact of across-pupil transmittance variation in projection lenses on fine device pattern imaging Sato, K., Mimotogi, S., Inoue, S., Higashiki, T. SPIE-The International Society for Optical Engineering	8 Conference Proceedings High-density sampling technique using special projections of light variation patterns in three-dimensional shape identification Tsujioka, K., Furuhashi, H., Hatano, K., Higa, S., Uchida, Y. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Flare-induced CD variation correction using transmittance controlled mask Nam, D.-S., Yeo, G.-S., Park, J.R., Choi, S.-W., Woo, S.-G., Cho, H.-K., Han, W.-S. SPIE-The International Society for Optical Engineering	9 Conference Proceedings Optical path design of the external diameter measurement system based on CCD and parallel light projection method with double light paths Q. Song, W. Wu, S. Zhu, H. Yan Society of Photo-optical Instrumentation Engineers
4 Conference Proceedings Evaluation of lens aberrations depending on the transmittance of DUV-attenuated PSM Park,J.-H., Kim,Y.-H., Lim,S.-C., Lee,K.-H., Choi,S.-W., Yoon,H.-S., Sohn,J.-M. SPIE - The International Society for Optical Engineering	10 Conference Proceedings Optical proximity correction using a transmittance-controlled mask (TCM) W.-S. Han, C.-J. Sohn, Y.-B. Kim, K.-H. Kim, H.-K. Kang Society of Photo-optical Instrumentation Engineers
5 Conference Proceedings Detection of half-tone PSM pinhole with DUV reflected light source Fujiwara, T., Inoue, H., Okuda, K., Nomura, T., Tabata, M., Endo, S. SPIE-The International Society for Optical Engineering	11 Conference Proceedings KrF step-and-scan exposure system using higher-NA projection lens Suzuki,K., Wakamoto,S., Nishi,K. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Dependence of mask topography effects on pattern variation under hyper-NA lithography A. Mimotogi, M. Itoh, S. Mimotogi, K. Sato, T. Sato Society of Photo-optical Instrumentation Engineers	12 Conference Proceedings Novel technique for critical dimension measurements of phase-shift masks using broadband transmittance spectra in conjunction with RCWA [6349-162] Gray, A., Lam, J. C., Chen, S. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12