CD control for two-dimensional features in future technology nodes
- Author(s):
- Publication title:
- Optical Microlithography XIV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4346
- Pub. Year:
- 2001
- Vol.:
- 4346
- Pt.:
- One of Two Parts
- Page(from):
- 368
- Page(to):
- 378
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440327 [0819440329]
- Language:
- English
- Call no.:
- P63600/4346
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Analysis of the impact of reticle CD variations on the available process windows for a 100-nm CMOS process
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Advanced optical imaging platform for CD metrology and defect review on 130-nm to 100-nm node reticles: and overview of preliminary results
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
Assessment of a hypothetical road map that extends optical lithography through the 70-nm technology node
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Assessment of a hypothetical roadmap that extends optical lithography through the 70-nm technology node
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |